TY  - JOUR
AU  - Kangarlou, Haleh 
AU  - Rafizadeh, Saeid 
PY  - 2011
TI  - Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers
JF  - American Journal of Applied Sciences
VL  - 8
IS  - 8
DO  - 10.3844/ajassp.2011.777.781
UR  - https://thescipub.com/abstract/ajassp.2011.777.781
AB  - Problem statement: Ti films of the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Approach: Different annealing temperatures 423 K, 523 K and 623 K with uniform 7 cm3 sec-1, oxygen flow, were used to produce titanium oxide layers. Results: Thin film structures were studied using AFM, XRD and spectrophotometer methods. Roughness of the films changed due to annealing process. Conclusion/Recommendations: The getting property of Ti and annealing temperature can play an important role on the structure of the films.